Afilm Semiconductor's 1st PECVD Amorphous Carbon Equipment Completed Debugging

Afilm has completed the Carbon thin film process equipment at technology node of 90/65nm and below, and can produce samples according to customer specifications.

Afilm started the project on June 11th, achieved RF power-on in early September, and completed the marathon and DOE data organization on October 9th.

We achieved a phased goal by taking 4 months to complete the development and application of Carbon equipment.

Afilm's R&D team can match process specifications for similar equipment from domestic and international manufacturers rapidly by compiling DOE data. 

Process optimization and recommendations can be provided based on customer requirements to accelerate R&D and mass production processes.

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