2024-03-27

Dubhe- P12, The First 12-inch PECVD

Jiangsu AfilmSemiconductor Technology Co., Ltd. has currently completed the design of the first 12 inch PECVD (Plasma Enhanced CVD) equipment, Dubhe-P12, with independent intellectual property rights.

In the process of developing semiconductor chip technology to the 90nm node and below, PECVD equipment plays an important role.

With the effect of plasma, the chemical reaction temperature is significantly reduced,and the film quality, uniformity, and particle size are all well controlled.

The completion of Dubhe-P12 design marks Jiangsu Afilm Semiconductor has entered the ranks of thin‑film deposition equipment suppliers officially, by providing semiconductor chip manufacturers with high-performance PECVD equipment.

01 Dr. Li Jigang,Chief Technology Officer,

stated the completion of the Dubhe‑P12 PECVD design marks Afilm's entry to the domestic12-inch and below semiconductor thin-film deposition market.

Domestic film deposition equipment of 12 inches and below accounts for over 30% of the global market for similar products，and this equipment will help domestic fabs to solve production capacity and break through blockades. Meanwhile, Jiangsu Afilm customizes equipment according to the needs of different customers to achieve special processes.

02 Product brief introduction

Dubhe-P12 PECVD equipment not only can achieve the thin-film deposition of materials such as PE-TEOS oxide, PE-SiH4 oxide, and PE-SiN which are widely used in advanced manufacturing within wafer fabs, including logic chips, DRAM, 3D NAND, and Micro-OLED for 28nm and above mature process technologies, but also offers broad application scopes and promising market prospects.

03 Company profile

AFilm Semiconductor, established in 2023, specializes in the R&D, manufacturing, sales, and technical services of advanced semiconductor process equipment. Its primary products include thin-film deposition equipment for the semiconductor and pan-semiconductor sectors.